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dc.contributor.authorYalamanchili, Kumar
dc.contributor.authorWang, Fei
dc.contributor.authorAboulfadl, Hisham
dc.contributor.authorBarrirero, Jenifer
dc.contributor.authorRogstrom, Lina
dc.contributor.authorJiménez Piqué, Emilio
dc.contributor.authorMücklich, F.
dc.contributor.authorTasnadi, Ferenc
dc.contributor.authorOdén, Magnus
dc.contributor.authorGhafoor, N
dc.contributor.otherUniversitat Politècnica de Catalunya. Departament de Ciència dels Materials i Enginyeria Metal·lúrgica
dc.date.accessioned2017-01-18T14:08:15Z
dc.date.available2018-12-01T01:30:27Z
dc.date.issued2016-12-01
dc.identifier.citationYalamanchili, K., Wang, F., Aboulfadl, H., Barrirero, J., Rogstrom, L., Jimenez-Pique, E., Mücklich, F., Tasnadi, F., Oden, M., Ghafoor, N. Growth and thermal stability of TiN/ZrAlN: Effect of internal interfaces. "Acta materialia", 1 Desembre 2016, vol. 121, p. 396-406.
dc.identifier.issn1359-6454
dc.identifier.urihttp://hdl.handle.net/2117/99602
dc.description.abstractWear resistant hard films comprised of cubic transition metal nitride (c-TMN) and metastable c-AlN with coherent interfaces have a confined operating envelope governed by the limited thermal stability of metastable phases. However, equilibrium phases (c-TMN and wurtzite(w)-AlN) forming semicoherent interfaces during film growth offer higher thermal stability. We demonstrate this concept for a model multilayer system with TiN and ZrAlN layers where the latter is a nanocomposite of ZrN- and AlN- rich domains. The interfaces between the domains are tuned by changing the AlN crystal structure by varying the multilayer architecture and growth temperature. The interface energy minimization at higher growth temperature leads to formation of semicoherent interfaces between w-AlN and c-TMN during growth of 15 nm thin layers. Ab initio calculations predict higher thermodynamic stability of semicoherent interfaces between c-TMN and w-AlN than isostructural coherent interfaces between c-TMN and c-AlN. The combination of a stable interface structure and confinement of w-AlN to nm-sized domains by its low solubility in c-TMN in a multilayer, results in films with a stable hardness of 34 GPa even after annealing at 1150 °C.
dc.format.extent11 p.
dc.language.isoeng
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/3.0/es/
dc.subjectÀrees temàtiques de la UPC::Enginyeria dels materials
dc.subject.lcshThin films, Multilayered
dc.subject.lcshNanostructured materials
dc.subject.lcshNanotechnology
dc.subject.otherThermal stability
dc.subject.otherTM-Al-N multilayer films
dc.subject.otherNanostructured materials
dc.subject.otherInterface energy
dc.subject.otherThree-dimensional atom probe (3DAP)
dc.subject.otherTransmission electron microscopy
dc.titleGrowth and thermal stability of TiN/ZrAlN: Effect of internal interfaces
dc.typeArticle
dc.subject.lemacMaterials nanoestructurals
dc.subject.lemacNanotecnologia
dc.contributor.groupUniversitat Politècnica de Catalunya. CIEFMA - Centre d'Integritat Estructural, Fiabilitat i Micromecànica dels Materials
dc.identifier.doi10.1016/j.actamat.2016.07.006
dc.description.peerreviewedPeer Reviewed
dc.relation.publisherversionhttp://www.sciencedirect.com/science/article/pii/S135964541630502X
dc.rights.accessOpen Access
local.identifier.drac19286318
dc.description.versionPostprint (author's final draft)
local.citation.authorYalamanchili, K.; Wang, F.; Aboulfadl, H.; Barrirero, J.; Rogstrom, L.; Jimenez-Pique, E.; Mücklich, F.; Tasnadi, F.; Oden, M.; Ghafoor, N.
local.citation.publicationNameActa materialia
local.citation.volume121
local.citation.startingPage396
local.citation.endingPage406


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