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dc.contributor.authorSánchez Chiva, José María
dc.contributor.authorValle Fraga, Juan José
dc.contributor.authorFernández, Daniel
dc.contributor.authorMadrenas Boadas, Jordi
dc.contributor.otherUniversitat Politècnica de Catalunya. Doctorat en Enginyeria Electrònica
dc.contributor.otherUniversitat Politècnica de Catalunya. Departament d'Enginyeria Electrònica
dc.date.accessioned2021-03-03T10:23:20Z
dc.date.available2021-03-03T10:23:20Z
dc.date.issued2020-10-19
dc.identifier.citationSánchez-Chiva, J.M. [et al.]. A cmos-mems beol 2-axis lorentz-force magnetometer with device-level offset cancellation. "Sensors (Switzerland)", 19 Octubre 2020, vol. 20, núm. 20, p. 5899:1-5899:20.
dc.identifier.issn14248220
dc.identifier.urihttp://hdl.handle.net/2117/340811
dc.description.abstractLorentz-force Microelectromechanical Systems (MEMS) magnetometers have been proposed as a replacement for magnetometers currently used in consumer electronics market. Being MEMS devices, they can be manufactured in the same die as accelerometers and gyroscopes, greatly reducing current solutions volume and costs. However, they still present low sensitivities and large offsets that hinder their performance. In this article, a 2-axis out-of-plane, lateral field sensing, CMOS-MEMS magnetometer designed using the Back-End-Of-Line (BEOL) metal and oxide layers of a standard CMOS (Complementary Metal–Oxide–Semiconductor) process is proposed. As a result, its integration in the same die area, side-by-side, not only with other MEMS devices, but with the readout electronics is possible. A shielding structure is proposed that cancels out the offset frequently reported in this kind of sensors. Full-wafer device characterization has been performed, which provides valuable information on device yield and performance. The proposed device has a minimum yield of 85.7% with a good uniformity of the resonance frequency fr = 56.8 kHz, sfr = 5.1 kHz and quality factor Q = 7.3, sQ = 1.6 at ambient pressure. Device sensitivity to magnetic field is 37.6 fA·µT -1 at P = 1130 Pa when driven with I = 1 mApp.
dc.description.sponsorshipThis research was supported in part under project RTI2018-099766-B-I00 by the Spanish Ministry of Science, Innovation and Universities, the State Research Agency (AEI), and the European Social Fund (ESF).
dc.language.isoeng
dc.subjectÀrees temàtiques de la UPC::Matemàtiques i estadística::Matemàtica aplicada a les ciències
dc.subject.lcshElectromagnetic theory
dc.subject.otherMEMS
dc.subject.othermagnetic sensor
dc.subject.othermagnetometer
dc.subject.otherLorentz-force
dc.subject.otheroffset suppression
dc.subject.othermicromachined Resonator
dc.subject.othermicromechanical oscillator
dc.titleA cmos-mems beol 2-axis lorentz-force magnetometer with device-level offset cancellation
dc.typeArticle
dc.subject.lemacElectromagnetisme
dc.contributor.groupUniversitat Politècnica de Catalunya. ISSET - Integrated Smart Sensors and Health Technologies
dc.identifier.doi10.3390/s20205899
dc.description.peerreviewedPeer Reviewed
dc.subject.amsClassificació AMS::78 Optics, electromagnetic theory::78M Basic methods
dc.relation.publisherversionhttps://www.mdpi.com/1424-8220/20/20/5899
dc.rights.accessOpen Access
local.identifier.drac30424487
dc.description.versionPostprint (published version)
dc.relation.projectidinfo:eu-repo/grantAgreement/AEI/Plan Estatal de Investigación Científica y Técnica y de Innovación 2017-2020/RTI2018-099766-B-I00/ES/INTEGRACION DE CMOS-MEMS AVANZADOS PARA SISTEMAS DE NUEVA GENERACION A ESCALA MILIMETRICA/
local.citation.authorSánchez-Chiva, J.M.; Valle, J.; Fernández, D.; Madrenas, J.
local.citation.publicationNameSensors (Switzerland)
local.citation.volume20
local.citation.number20
local.citation.startingPage5899:1
local.citation.endingPage5899:20


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