Exploració per autor "Valle Fraga, Juan José"
Ara es mostren els items 1-9 de 9
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A cmos-mems beol 2-axis lorentz-force magnetometer with device-level offset cancellation
(2020-10-19)
Article
Accés obertLorentz-force Microelectromechanical Systems (MEMS) magnetometers have been proposed as a replacement for magnetometers currently used in consumer electronics market. Being MEMS devices, they can be manufactured in the ... -
A mixed-signal control system for Lorentz-force resonant MEMS magnetometers
(2019-09-01)
Article
Accés obertThis paper presents a mixed-signal closed-loop control system for Lorentz force resonant MEMS magnetometers. The control system contributes to 1) the automatic phase control of the loop, that allows start-up and keeps ... -
A test setup for the characterization of Lorentz-force MEMS magnetometers
(2021-09-13)
Article
Accés obertLorentz-force MEMS magnetometers are interesting candidates for the replacement of magnetometers in consumer electronics products. Plenty of works in the literature propose MEMS magnetometers, their readout circuits and ... -
Closed-form equation for natural frequencies of beams under full range of axial loads modeled with a spring-mass system
(2019-04-01)
Article
Accés obertA new simple closed-form equation that accurately predicts the effect of an arbitrarily large constant axial load, residual stress or temperature shift on the natural frequencies of an uniform single-span beam, with various ... -
Curvature of BEOL cantilevers in CMOS-MEMS processes
(2017-08-01)
Article
Accés obertThis paper presents the curvature characterization results of released back-end-of-line 5 µm-wide cantilevers for two different 0.18-µm 1P6M complementary metal-oxide semiconductor microelectromechanical systems processes. ... -
Design, fabrication, characterization and reliability study of CMOS-MEMS Lorentz-force magnetometers
(2022-09-16)
Article
Accés obertThis article presents several design techniques to fabricate micro-electro-mechanical systems (MEMS) using standard complementary metal-oxide semiconductor (CMOS) processes. They were applied to fabricate high yield CMOS-MEMS ... -
Design, fabrication, characterization and reliability study of CMOS-MEMS Lorentz-Force magnetometers
(Universitat Politècnica de Catalunya, 2022-04-06)
Tesi
Accés obertToday, the most common form of mass-production semiconductor device fabrication is Complementary Metal-Oxide Semiconductor (CMOS) technology. The dedicated Integrated Circuit (IC) interfaces of commercial sensors are ... -
Manufacturing Issues of BEOL CMOS-MEMS Devices
(Institute of Electrical and Electronics Engineers (IEEE), 2021-06-07)
Article
Accés obertIn this paper we present a comprehensive report on the issues found during the manufacturing of high-yield CMOS-MEMS sensors based on vapor-phase hydrogen fluoride (vapor- HF ) oxide etching. During the study we have ... -
Monolithic sensor integration in CMOS technologies
(Institute of Electrical and Electronics Engineers (IEEE), 2022-12-09)
Article
Accés obertBesides being mainstream for mixed-signal electronics, CMOS technology can be used to integrate micro-electromechanical system (MEMS) on a single die, taking advantage of the structures and materials available in feature ...
