K2 - AI-Assisted Yield Learning
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Document typeConference report
Defense date2022-05
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Abstract
Root Cause Analysis (RCA) and Layout Pattern Analysis (LPA) are critical technologies for
Diagnosis Driven Yield Learning in designing and manufacturing integrated circuits. Recent
advancements of AI technologies can help improving yield learning accuracy and transferring
the yield learning experiences from old designs to new designs or from old technologies to the
new ones.
In this talk, we share our experiences in this research area and discuss the following
techniques:
(1) A neural-network-based framework for RCA. The framework has a self-adaptive module
that is able to adapt the inference module to new designs and new technologies based on
a few new samples.
(2) An encoder network framework for LPA. It applies Contrastive Learning to extract
representations of layout snippets that are invariant to trivial transformations such as
shift, rotation, and mirroring. The layout snippets are then clustered to form layout
patterns. The causal relationship between any potential layout patterns and the
systematic defects is identified by the Causal Representation Learning.
(3) An unsupervised learning framework by using a Deep Latent Variable model consisting of
a probabilistic encoder and a regularization decoder. The encoder transforms the features
from diagnosis reports to latent variables characterizing the root cause distribution. The
regularization decoder uses a Graph Attention Network to represent the mapping from
the true root causes to suspicious root causes reported.
CitationHuang, Y. K2 - AI-Assisted Yield Learning. A: 27th IEEE European Test Symposium (ETS). 2022,