Influence of punch trough stop layer and well depths on the robustness of bulk FinFETs to heavy ions impact
PublisherInstitute of Electrical and Electronics Engineers (IEEE)
Rights accessOpen Access
Except where otherwise noted, content on this work is licensed under a Creative Commons license : Attribution 4.0 International
ProjectTHE VARIABILITY CHALLENGE IN NANO-CMOS AND BEYOND-CMOS: NOVEL IC DESIGN PARADIGMS FOR MITIGATION AND EXPLOITATION (VIGILANT-UPC) (AEI-PID2019-103869RB-C33)
This study analyzes the effects of the punch-through stop (PTS) layer and well depth in a bulk FinFET SRAM cell on the fraction of charge generated by an ion impact that is collected by the FinFET channel. More than 1700 3D TCAD simulations have been performed to obtain a detailed map of the sensitivity areas in a full cell 6-T SRAM 22 nm bulk-FinFET process. The influence of the well depth on the charge collected by the drain devices of the SRAM cell has been studied, and it has been concluded that the collected charge can be reduced down to 300% simply by modifying the depth of the well, without affecting the performance of the cell. Different PTS layer depths have been analyzed in order to calculate which value minimizes the impact of the charge generated by an ion during its track along the FinFET body. The simulations carried out allow to conclude that the incorporation of a PTS layer not only reduces the leakage current, but also reduces the amount of charge, delivered by the ion, that reaches the drain region. Simulation results also show that the fraction of the charge generated by the ion impact, which is collected by the drain, mainly depends on the depth of the wells, whereas the PTS layer hardly modifies the collected charge.
CitationCalomarde, A. [et al.]. Influence of punch trough stop layer and well depths on the robustness of bulk FinFETs to heavy ions impact. "IEEE access", 2 Maig 2022, vol. 10, p. 47169-47178.
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