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Deposition and characterisation of sputtered molybdenum oxide thin films with hydrogen atmosphere
dc.contributor.author | López-Pintó, Nicolau |
dc.contributor.author | Tom, Thomas |
dc.contributor.author | Bertomeu Bo, Joan |
dc.contributor.author | Asensi López, José Miguel |
dc.contributor.author | Ros Costals, Eloi |
dc.contributor.author | Ortega Villasclaras, Pablo Rafael |
dc.contributor.author | Voz Sánchez, Cristóbal |
dc.contributor.other | Universitat Politècnica de Catalunya. Doctorat en Enginyeria de la Construcció |
dc.contributor.other | Universitat Politècnica de Catalunya. Doctorat en Enginyeria Electrònica |
dc.contributor.other | Universitat Politècnica de Catalunya. Departament d'Enginyeria Electrònica |
dc.date.accessioned | 2021-07-22T16:23:37Z |
dc.date.available | 2021-07-22T16:23:37Z |
dc.date.issued | 2021-10 |
dc.identifier.citation | López-Pintó, N. [et al.]. Deposition and characterisation of sputtered molybdenum oxide thin films with hydrogen atmosphere. "Applied surface science", Octubre 2021, vol. 563, p. 150285:1-150285:8. |
dc.identifier.issn | 0169-4332 |
dc.identifier.uri | http://hdl.handle.net/2117/349969 |
dc.description.abstract | Sputtered films of reduced molybdenum oxide (MoOx) with a molybdenum trioxide target in different pressures and atmospheres were deposited in varying temperatures. Compositional, optic, and electric characteristics of the samples were studied. X-ray photoelectron spectroscopy revealed reduced states when working in the hydrogen + argon atmosphere implying that stoichiometry could be controlled by adding some hydrogen in the sputtering chamber. The effect of slightly increasing the substrate temperature during deposition was also studied and lead to the presence of metastable Mo4+ states at 3 mTorr. Optical properties match the ones already in the literature, and transmittances of 90% were achieved. The results support sputtering as a viable method of depositing MoOx films apart from thermal evaporation for many applications. |
dc.description.sponsorship | This research has been supported by the Spanish Ministerio de Economía, Industria y Competitividad (ENE2016-78933-C4-1-R and ENE2016-78933-C4-2-R), Ministerio de Ciencia e Innovación (PID2019-109215RB-C4-1 and PID2019-109215RB-C4-3) and the European Regional Development Fund. One of the authors (T. Tom) acknowledges the support of the Secretaria d'Universitats i Recerca de la Generalitat de Catalunya and European Social Fund (2019 FI_B 00456). |
dc.language.iso | eng |
dc.rights | © 2019. Elsevier |
dc.rights | Attribution-NonCommercial-NoDerivatives 4.0 International |
dc.rights.uri | https://creativecommons.org/licenses/by-nc-nd/4.0/ |
dc.subject | Àrees temàtiques de la UPC::Enginyeria electrònica::Optoelectrònica |
dc.subject.lcsh | Molybdenum oxides |
dc.subject.other | MoO3 thin films |
dc.subject.other | Reactive sputtering |
dc.subject.other | Hydrogen atmosphere |
dc.subject.other | Reduced molybdenum oxide |
dc.title | Deposition and characterisation of sputtered molybdenum oxide thin films with hydrogen atmosphere |
dc.type | Article |
dc.subject.lemac | Molibdè |
dc.contributor.group | Universitat Politècnica de Catalunya. MNT - Grup de Recerca en Micro i Nanotecnologies |
dc.identifier.doi | 10.1016/j.apsusc.2021.150285 |
dc.description.peerreviewed | Peer Reviewed |
dc.relation.publisherversion | https://www.sciencedirect.com/science/article/pii/S016943322101360X |
dc.rights.access | Open Access |
local.identifier.drac | 31946795 |
dc.description.version | Postprint (published version) |
dc.relation.projectid | info:eu-repo/grantAgreement/MINECO/1PE/ENE2016-78933-C4-1-R |
dc.relation.projectid | info:eu-repo/grantAgreement/MINECO/1PE/ENE2016-78933-C4-1-R |
local.citation.author | López-Pintó, N.; Tom, T.; Bertomeu, J.; Asensi, J.M.; Ros, E.; Ortega, P.; Voz, C. |
local.citation.publicationName | Applied surface science |
local.citation.volume | 563 |
local.citation.startingPage | 150285:1 |
local.citation.endingPage | 150285:8 |
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