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dc.contributor.authorZuo, Yong
dc.contributor.authorLi, Junshan
dc.contributor.authorYu, Xiaoting
dc.contributor.authorDu, Ruifeng
dc.contributor.authorZhang, Ting
dc.contributor.authorWang, Xiang
dc.contributor.authorArbiol, Jordi
dc.contributor.authorLlorca Piqué, Jordi
dc.contributor.authorCabot, Andreu
dc.contributor.otherUniversitat Politècnica de Catalunya. Departament d'Enginyeria Química
dc.date.accessioned2021-04-20T12:20:05Z
dc.date.available2021-04-20T12:20:05Z
dc.date.issued2020-02-11
dc.identifier.citationZuo, Y. [et al.]. A SnS2 molecular precursor for conformal nanostructured coatings. "Chemistry of materials", 11 Febrer 2020, vol. 32, núm. 5, p. 2097-2106.
dc.identifier.issn0897-4756
dc.identifier.urihttp://hdl.handle.net/2117/344003
dc.description.abstractWe present a simple, versatile, and scalable procedure to produce SnS2 nanostructured layers based on an amine/thiol-based molecular ink. The ratios amine/thiol and Sn/S, and the reaction conditions, are systematically investigated to produce phase-pure SnS2 planar and conformal layers with a tremella-like SnS2 morphology. Such nanostructured layers are characterized by excellent photocurrent densities. The same strategy can be used to produce SnS2–graphene composites by simply introducing graphene oxide (GO) into the initial solution. Conveniently, the solvent mixture is able to simultaneously dissolve the Sn and Se powders and reduce the GO. Furthermore, SnS2-xSex ternary coatings and phase-pure SnSe2 can be easily produced by simply incorporating proper amounts of Se into the initial ink formulation. Finally, the potential of this precursor ink to produce gram-scale amounts of unsupported SnS2 is investigated.
dc.format.extent10 p.
dc.language.isoeng
dc.publisherAmerican Chemical Society (ACS)
dc.rightsAttribution-NonCommercial-NoDerivs 3.0 Spain
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/3.0/es/
dc.subjectÀrees temàtiques de la UPC::Enginyeria química
dc.subject.lcshPhotocatalysis
dc.subject.otherTin disulfide
dc.subject.otherAmine/thiol
dc.subject.otherMolecular ink
dc.subject.otherPhotocatalysis
dc.subject.otherConformal coating
dc.titleA SnS2 molecular precursor for conformal nanostructured coatings
dc.typeArticle
dc.subject.lemacFotocatàlisi
dc.contributor.groupUniversitat Politècnica de Catalunya. NEMEN - Nanoenginyeria de materials aplicats a l'energia
dc.identifier.doi10.1021/acs.chemmater.9b05241
dc.relation.publisherversionhttps://pubs.acs.org/doi/10.1021/acs.chemmater.9b05241
dc.rights.accessOpen Access
local.identifier.drac27559164
dc.description.versionPostprint (author's final draft)
local.citation.authorZuo, Y.; Li, J.; Yu, X.; Du, R.; Zhang, T.; Wang, X.; Arbiol , J.; Llorca, J.; Cabot, A.
local.citation.publicationNameChemistry of materials
local.citation.volume32
local.citation.number5
local.citation.startingPage2097
local.citation.endingPage2106


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