Comparison of Shack-Hartmann sensor and point diffraction interferometer for wavefront aberration analysis
Document typeConference report
PublisherInstitute of Electrical and Electronics Engineers (IEEE)
Rights accessOpen Access
Except where otherwise noted, content on this work is licensed under a Creative Commons license : Attribution-NonCommercial-NoDerivs 3.0 Spain
Two methods for assessing the image quality of optical systems based on the analysis of wavefront aberration (WA) are presented together. The methods and the experimental setups are broadly described. A comparative study between those two techniques on the analysis of a meniscus lens has been carried out and an equivalence between both techniques has been tested and demonstrated, by comparing the RMS associated to their measured Zernike coefficients.
CitationMarzoa, A.; Vallmitjana, S.; Bosch, S. Comparison of Shack-Hartmann sensor and point diffraction interferometer for wavefront aberration analysis. A: Workshop on Information Optics. "WIO2016: 15th Workshop on Information Optics: Barcelona, 11-15 July 2016". Institute of Electrical and Electronics Engineers (IEEE), 2016, p. 1-10. ISBN 978-1-5090-2163-5. DOI 10.1109/WIO.2016.7745586.