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dc.contributor.authorGarín, Moisés
dc.contributor.authorKhoury, Rasha
dc.contributor.authorMartín García, Isidro
dc.contributor.authorJohnson, Erik
dc.contributor.otherUniversitat Politècnica de Catalunya. Departament d'Enginyeria Electrònica
dc.date.accessioned2020-09-28T15:28:05Z
dc.date.available2021-03-26T01:26:38Z
dc.date.issued2020-04-28
dc.identifier.citationGarín, M. [et al.]. Direct etching at the nanoscale through nanoparticle-directed capillary condensation. "Nanoscale", 28 Abril 2020, vol. 12, p. 9240-9245.
dc.identifier.issn2040-3364
dc.identifier.urihttp://hdl.handle.net/2117/329318
dc.description.abstractWe report a method to locally deliver a chemical etchant at the nanoscale in the vapor phase by capillary condensation forming a meniscus at the nanoparticle/substrate interface. The process is simple, scalable and does not require functionalization of the nanoparticles. Furthermore, it does not rely on any specific chemical properties of the materials other than the solution being aqueous and the wettability properties of the surfaces involved, which should enable its application to other material and chemical combinations. In particular, in this work we demonstrate the proposed process by periodically pattering a SiO2 layer using a self-assembled monolayer of polystyrene particles exposed to HF vapors. The patterned SiO2 layer is then used as a mask to etch a pattern of inverted nanopyramids on Si. The silicon nanopatterning has been demonstrated for particles sizes ranging from 800 nm down to 100 nm, providing pyramids with a size down to 50 nm for 100 nm nanoparticles.
dc.description.sponsorshipThis work has been financially supported by the following projects: ENE2015-74009-JIN funded by the Spanish Ministry of Economy and Competitiveness (MINECO) and the European Regional Development Fund (ERDF-EU), TEC2017-82305-R (MINECO), the InnoEnergy PhD School Programme and the European Institute of Technology (EIT).
dc.format.extent6 p.
dc.language.isoeng
dc.subjectÀrees temàtiques de la UPC::Enginyeria química
dc.subject.lcshNanotecnology
dc.subject.lcshChemical engineering
dc.titleDirect etching at the nanoscale through nanoparticle-directed capillary condensation
dc.typeArticle
dc.subject.lemacNanotecnologia
dc.subject.lemacEnginyeria química
dc.contributor.groupUniversitat Politècnica de Catalunya. MNT - Grup de Recerca en Micro i Nanotecnologies
dc.identifier.doi10.1039/c9nr10217e
dc.description.peerreviewedPeer Reviewed
dc.relation.publisherversionhttps://pubs.rsc.org/en/content/articlelanding/2020/NR/C9NR10217E#!divAbstract
dc.rights.accessOpen Access
local.identifier.drac28933156
dc.description.versionPostprint (author's final draft)
dc.relation.projectidinfo:eu-repo/grantAgreement/MINECO//ENE2015-74009-JIN/ES/HACIA LA OBTENCION DE MULTIPLES CELULAS MONOCRISTALINAS DE SILICIO CON 20% DE EFICIENCIA Y MENOS DE 20 µM DE GROSOR A PARTIR DE UNA UNICA OBLEA./
dc.relation.projectidinfo:eu-repo/grantAgreement/AEI/Plan Estatal de Investigación Científica y Técnica y de Innovación 2013-2016/TEC2017-82305-R/ES/CELULAS SOLARES CON CONTACTOS POSTERIORES BASADAS EN SUBSTRATOS DELGADOS DE SILICIO CRISTALINO/
local.citation.authorGarín, M.; Khoury, R.; Martin, I.; Johnson, E.
local.citation.publicationNameNanoscale
local.citation.volume12
local.citation.startingPage9240
local.citation.endingPage9245


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