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dc.contributor.authorHernández García, David
dc.contributor.authorTodorov Trifonov, Trifon
dc.contributor.authorGarin Escriva, Moises
dc.contributor.authorAlcubilla González, Ramón
dc.contributor.otherUniversitat Politècnica de Catalunya. Departament d'Enginyeria Electrònica
dc.date.accessioned2013-10-18T12:40:56Z
dc.date.available2013-10-18T12:40:56Z
dc.date.created2013-04-29
dc.date.issued2013-04-29
dc.identifier.citationHernandez, D. [et al.]. “Silicon millefeuille” : From a silicon wafer to multiple thin crystalline films in a single step. "Applied physics letters", 29 Abril 2013, vol. 102, núm. 17, p. 1-4.
dc.identifier.issn0003-6951
dc.identifier.urihttp://hdl.handle.net/2117/20420
dc.description.abstractDuring the last years, many techniques have been developed to obtain thin crystalline films from commercial silicon ingots. Large market applications are foreseen in the photovoltaic field, where important cost reductions are predicted, and also in advanced microelectronics technologies as three-dimensional integration, system on foil, or silicon interposers [Dross et al., Prog. Photovoltaics 20, 770-784 (2012); R.Brendel, Thin Film Crystalline Silicon Solar Cells (Wiley-VCH, Weinheim, Germany 2003); J. N. Burghartz, Ultra-Thin Chip Technology and Applications (Springer ScienceþBusiness Media, NY, USA, 2010)]. Existing methods produce “one at a time” silicon layers, once one thin film is obtained, the complete process is repeated to obtain the next layer. Here, we describe a technology that, from a single crystalline silicon wafer, produces a large number of crystalline films with controlled thickness in a single technological step.
dc.format.extent4 p.
dc.language.isoeng
dc.subjectÀrees temàtiques de la UPC::Enginyeria electrònica::Microelectrònica
dc.subject.lcshNanosilicon.
dc.subject.lcshCrystals.
dc.subject.lcshMicroelectronics.
dc.subject.otherControlled thickness
dc.subject.otherCrystalline films
dc.subject.otherMarket applications
dc.subject.otherMicroelectronics technology
dc.subject.otherSilicon interposers
dc.subject.otherSingle crystalline silicon
dc.subject.otherThin film crystalline silicon
dc.subject.otherThree dimensional integration
dc.title“Silicon millefeuille” : From a silicon wafer to multiple thin crystalline films in a single step
dc.typeArticle
dc.subject.lemacNanotecnologia
dc.subject.lemacMicroelectrònica
dc.subject.lemacCristalls
dc.subject.lemacSilicones
dc.contributor.groupUniversitat Politècnica de Catalunya. MNT - Grup de Recerca en Micro i Nanotecnologies
dc.identifier.doi10.1063/1.4803009
dc.relation.publisherversionhttp://apl.aip.org/resource/1/applab/v102/i17/p172102_s1
dc.rights.accessOpen Access
local.identifier.drac12670101
dc.description.versionPostprint (published version)
local.citation.authorHernandez, D.; Trifonov, T.; Garin, M.; Alcubilla, R.
local.citation.publicationNameApplied physics letters
local.citation.volume102
local.citation.number17
local.citation.startingPage1
local.citation.endingPage4


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