Optical and compositional characterization of GaAs(Ti) thin films deposited by R.F. magnetron sputtering
Visualitza/Obre
Optical and compositional characterization of GaAs(Ti) thin films deposited by R.F. magnetron sputtering (833,4Kb) (Accés restringit)
Sol·licita una còpia a l'autor
Què és aquest botó?
Aquest botó permet demanar una còpia d'un document restringit a l'autor. Es mostra quan:
- Disposem del correu electrònic de l'autor
- El document té una mida inferior a 20 Mb
- Es tracta d'un document d'accés restringit per decisió de l'autor o d'un document d'accés restringit per política de l'editorial
10.1016/j.jnoncrysol.2012.09.017
Inclou dades d'ús des de 2022
Cita com:
hdl:2117/19895
Tipus de documentArticle
Data publicació2013-01
Condicions d'accésAccés restringit per política de l'editorial
Llevat que s'hi indiqui el contrari, els
continguts d'aquesta obra estan subjectes a la llicència de Creative Commons
:
Reconeixement-NoComercial-SenseObraDerivada 3.0 Espanya
Abstract
GaAs thin films with Ti incorporated, to which we refer to as GaAs(Ti), have been deposited by R.F. sputtering on fused silica and c-GaAs substrates under different process conditions. The films were characterized by EPMA, XPS and XRD to study the composition and structural dependence on the deposition conditions, paying special attention on the Ti content of the films. The optical responses of the films were analyzed by spectrofotometric, PDS and FTIR measurements. The Ti content is in all the samples above 1020 atoms/cm3, so we can consider them as GaAs films highly Ti doped. It has been observed that an evolution of the Ga/As atomic content in relation with the Ti incorporation, which together with the results obtained from XPS measurements, indicates a possible substitution of Ga by Ti atoms in the deposited films.
CitacióBoronat, A.; Silvestre, S.; Castañer, L. Optical and compositional characterization of GaAs(Ti) thin films deposited by R.F. magnetron sputtering. "Journal of non-crystalline solids", Gener 2013, vol. 359, núm. 1, p. 21-26.
ISSN0022-3093
Versió de l'editorhttp://www.sciencedirect.com/science/article/pii/S0022309312005637
Fitxers | Descripció | Mida | Format | Visualitza |
---|---|---|---|---|
1-s2.0-S0022309312005637-main.pdf | Optical and compositional characterization of GaAs(Ti) thin films deposited by R.F. magnetron sputtering | 833,4Kb | Accés restringit |