Mostra el registre d'ítem simple

dc.contributor.authorRoa Rovira, Joan Josep
dc.contributor.authorGilioli, E.
dc.contributor.authorBissoli, F.
dc.contributor.authorPatini, F.
dc.contributor.authorRampino, S.
dc.contributor.authorCapdevila, X.G.
dc.contributor.authorSegarra, M.
dc.contributor.otherUniversitat Politècnica de Catalunya. Departament de Ciència dels Materials i Enginyeria Metal·lúrgica
dc.date.accessioned2013-01-25T12:35:15Z
dc.date.created2009-11-02
dc.date.issued2009-11-02
dc.identifier.citationRoa, J. [et al.]. Study of the mechanical properties of CeO2 layers with the nanoindentation technique. "Thin solid films", 02 Novembre 2009, vol. 518, núm. 1, p. 227-232.
dc.identifier.issn0040-6090
dc.identifier.urihttp://hdl.handle.net/2117/17522
dc.description.abstractThe mechanical properties of CeO2 layers that are undoped or doped with other elements (e.g. Zr and Ta) are a topic of special interest specially in the manufacturing of superconductor buffer layers by pulsed electron deposition. Nowadays, the trend is to produce small devices (i.e. coated conductors), and the correct mechanical characterization is critical. In this sense, nanoindentation is a powerful technique widely employed to determine the mechanical properties of small volumes. In this study, the nanoindentation technique allow us determine the hardness (H) and Young's modulus (E) by sharp indentation of different buffer layers to explore the deposition process of CeO2 that is undoped or doped with Zr and Ta, and deposited on Ni–5%W at room temperature. This study was carried out on various samples at different ranges of applied loads (from 0.5 to 500 mN). Scanning electron microscopy images show no cracking for CeO2 doped with Zr, as the doping agent increases the toughness fracture of the CeO2 layer. This system, presents better mechanical stability than the other studied systems. Thus, the H for Zr–CeO2 is around 2.75 · 106 Pa, and the elastic modulus calculated using the Bec et al. and Rar et al. models equals 249 · 106 Pa and 235 · 106 Pa respectively.
dc.format.extent6 p.
dc.language.isoeng
dc.rightsAttribution-NonCommercial-NoDerivs 3.0 Spain
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/3.0/es/
dc.subjectÀrees temàtiques de la UPC::Enginyeria dels materials
dc.subject.lcshElasticity
dc.subject.lcshThin films
dc.titleStudy of the mechanical properties of CeO2 layers with the nanoindentation technique
dc.typeArticle
dc.subject.lemacPel·lícules fines
dc.subject.lemacElasticitat
dc.identifier.doi10.1016/j.tsf.2009.07.132
dc.description.peerreviewedPeer Reviewed
dc.relation.publisherversionhttp://www.sciencedirect.com/science/article/pii/S004060900901267X#
dc.rights.accessRestricted access - publisher's policy
local.identifier.drac11069346
dc.description.versionPostprint (published version)
dc.date.lift10000-01-01
local.citation.authorRoa, J.; Gilioli, E.; Bissoli, F.; Patini, F.; Rampino, S.; Capdevila, X.; Segarra, M.
local.citation.publicationNameThin solid films
local.citation.volume518
local.citation.number1
local.citation.startingPage227
local.citation.endingPage232


Fitxers d'aquest items

Imatge en miniatura

Aquest ítem apareix a les col·leccions següents

Mostra el registre d'ítem simple