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Optimization of FinFET-based gain cells for low power sub-vt embedded drams
dc.contributor.author | Amat, Esteve |
dc.contributor.author | Calomarde Palomino, Antonio |
dc.contributor.author | Canal Corretger, Ramon |
dc.contributor.author | Rubio Sola, Jose Antonio |
dc.contributor.other | Universitat Politècnica de Catalunya. Departament d'Enginyeria de Sistemes, Automàtica i Informàtica Industrial |
dc.contributor.other | Universitat Politècnica de Catalunya. Departament d'Arquitectura de Computadors |
dc.contributor.other | Universitat Politècnica de Catalunya. Departament d'Enginyeria Electrònica |
dc.date.accessioned | 2018-10-15T12:17:52Z |
dc.date.available | 2018-10-15T12:17:52Z |
dc.date.issued | 2018-06-01 |
dc.identifier.citation | Amat, E., Calomarde, A., Canal, R., Rubio, A. Optimization of FinFET-based gain cells for low power sub-vt embedded drams. "Journal of low power electronics", 1 Juny 2018, vol. 14, núm. 2, p. 236-243. |
dc.identifier.issn | 1546-1998 |
dc.identifier.uri | http://hdl.handle.net/2117/122302 |
dc.description.abstract | Sub-threshold circuits (sub-V T) are a promising alternative in the implementation of low power electronics. The implementation of gain-cell embedded DRAMs (eDRAMs) based on FinFET devices requires a careful design to achieve the maximum cell performance (i.e., retention time, access time, and energy consumption) suitable for the sub-V T operating level. In this work, we show that asymmetrically resizing the memory cell (i.e., the channel length of the write access transistor and the width of the rest of the devices) results in a 3.5× increase in retention time when compared to the nominal case while reducing area, as well. In terms of reliability (e.g., variability and soft errors), the resizing also improves the cell robustness (50% and 1.9×, respectively) when the cells are operated at sub-V T level. |
dc.format.extent | 8 p. |
dc.language.iso | eng |
dc.rights | Attribution-NonCommercial-NoDerivs 3.0 Spain |
dc.rights.uri | http://creativecommons.org/licenses/by-nc-nd/3.0/es/ |
dc.subject | Àrees temàtiques de la UPC::Enginyeria electrònica::Electrònica de potència |
dc.subject.lcsh | Power electronics |
dc.subject.other | SRAM |
dc.subject.other | DRAM |
dc.subject.other | gain-cells |
dc.subject.other | FinFET |
dc.title | Optimization of FinFET-based gain cells for low power sub-vt embedded drams |
dc.type | Article |
dc.subject.lemac | Electrònica de potència |
dc.contributor.group | Universitat Politècnica de Catalunya. HIPICS - Grup de Circuits i Sistemes Integrats d'Altes Prestacions |
dc.contributor.group | Universitat Politècnica de Catalunya. VIRTUOS - Virtualisation and Operating Systems |
dc.description.peerreviewed | Peer Reviewed |
dc.relation.publisherversion | http://www.ingentaconnect.com/content/asp/jolpe/2018/00000014/00000002/art00007;jsessionid=71piba2tmqjc4.x-ic-live-02 |
dc.rights.access | Open Access |
local.identifier.drac | 23329845 |
dc.description.version | Postprint (published version) |
local.citation.author | Amat, E.; Calomarde, A.; Canal, R.; Rubio, A. |
local.citation.publicationName | Journal of low power electronics |
local.citation.volume | 14 |
local.citation.number | 2 |
local.citation.startingPage | 236 |
local.citation.endingPage | 243 |
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