Copper phthalocyanine thin filma transistors with polymeric gate dielectric
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Document typeArticle
Defense date2006-06
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Abstract
Copper phthalocyanine (CuPc) thin-film transistors have been fabricated using polymethyl methacrylate (PMMA) as gate dielectric. A bottom gate, staggered structure was selected to study the device performance. CuPc thin-films were deposited by thermal evaporation in a high vacuum system. The maximum process temperature achieved was 100 °C, corresponding to the baking of the PMMA. The devices showed satisfactory p-type electrical characteristics with field-effect mobility and threshold voltage values around 0.2 × 10-4 cm2 V-1 s-1 and 6 V, respectively. The device electrical characteristics were correlated with the structural and morphological properties of the CuPc thin-films.
CitationPuigdollers, J., Voz, C., Fonrodona, M., Cheylan, S., Stella, M., Andreu Batallé, Jordi, Vetter, M., Alcubilla, R. Copper phthalocyanine thin filma transistors with polymeric gate dielectric. "Journal of non-crystalline solids", Juny 2006, vol. 352, núm. 9-20, p. 1778-1782.
ISSN0022-3093
Publisher versionhttps://www.sciencedirect.com/science/article/pii/S0022309306002079
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