Lithography aware regular cell design based on a predictive technology model
Tipus de documentArticle
Condicions d'accésAccés restringit per política de l'editorial
Projecte de la Comissió EuropeaSYNAPTIC - SYNthesis using Advanced Process Technology Integrated in regular Cells, IPs, architectures, and design platforms (EC-FP7-248538)
As semiconductor technology advances into the nanoscale era, optical effects such as channel narrowing, corner rounding or line-end pullback are critical to accomplish circuit yield specifications. It is well-demonstrated that layout regularity reduces the increasing impact of process variations on circuit performance and reliability. The aim of this paper is to present the layout design of a regular cell based on 1-D elements which reduces lithography perturbations (ALARC). We depict several undesirable lithography effects and how these distortions determine several layout parameters in order to achieve the required line-pattern resolution. Furthermore, it is shown how the measurement of leakage power consumption based on ideal layout is not a precise metric to evaluate circuit performance, especially for low power designs. Finally, the impact of lithography patterns on delay and leakage consumption of a typical cell is provided.
CitacióGómez, S.; Moll, F. Lithography aware regular cell design based on a predictive technology model. "Journal of low power electronics", Desembre 2010, vol. 6, núm. 4, p. 588-600.
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