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dc.contributor.authorDomínguez Pumar, Manuel
dc.contributor.authorBheesayagari, Chenna Reddy
dc.contributor.authorGorreta Mariné, Sergio
dc.contributor.authorLópez Rodríguez, Gema
dc.contributor.authorMartín García, Isidro
dc.contributor.authorBlokhina, Elena
dc.contributor.authorPons Nin, Joan
dc.contributor.otherUniversitat Politècnica de Catalunya. Departament d'Enginyeria Electrònica
dc.contributor.otherUniversitat Politècnica de Catalunya. Departament de Teoria del Senyal i Comunicacions
dc.date.accessioned2017-02-13T09:10:13Z
dc.date.available2017-02-13T09:10:13Z
dc.date.issued2016-12-26
dc.identifier.citationDominguez, M., Bheesayagari, C., Gorreta, S., Lopez, G., Martin, I., Blokhina, E., Pons, J. Charge trapping control in MOS capacitors. "IEEE transactions on industrial electronics", 26 Desembre 2016, vol. PP, núm. 99, p. 1-7.
dc.identifier.issn0278-0046
dc.identifier.urihttp://hdl.handle.net/2117/100877
dc.description.abstractThis paper presents an active control of C-V characteristic for MOS capacitors based on Sliding Mode control and sigma-delta-modulation. The capacitance of the device at a certain voltage is measured periodically and adequate voltage excitations are generated by a feedback loop to place the C-V curve at the desired target position. Experimental results are presented for a n-type c-Si MOS capacitor made with silicon dioxide. It is shown that with this approach it is possible to shift horizontally the C-V curve to the desired operation point. A physical analysis is also presented to explain how the C-V horizontal displacements can be linked to charge trapping in the bulk of the oxide and/or in the silicon-oxide interface. Finally, design criteria are provided for tuning the main parameters of the sliding mode controller.
dc.format.extent7 p.
dc.language.isoeng
dc.publisherInstitute of Electrical and Electronics Engineers (IEEE)
dc.subjectÀrees temàtiques de la UPC::Enginyeria electrònica::Microelectrònica
dc.subject.lcshMetal oxide semiconductors
dc.subject.otherCapacitance-voltage characteristics
dc.subject.otherVoltage measurement
dc.subject.otherCapacitance
dc.subject.otherCharge carrier processes
dc.subject.otherCapacitance measurement
dc.subject.otherMOS capacitors
dc.subject.otherFeedback loop
dc.titleCharge trapping control in MOS capacitors
dc.typeArticle
dc.subject.lemacMetall-òxid-semiconductors
dc.contributor.groupUniversitat Politècnica de Catalunya. MNT - Grup de Recerca en Micro i Nanotecnologies
dc.identifier.doi10.1109/TIE.2016.2645159
dc.description.peerreviewedPeer Reviewed
dc.relation.publisherversionhttp://ieeexplore.ieee.org/document/7797504/
dc.rights.accessOpen Access
local.identifier.drac19669876
dc.description.versionPostprint (author's final draft)
local.citation.authorDominguez, M.; Bheesayagari, C.; Gorreta, S.; Lopez, G.; Martin, I.; Blokhina, E.; Pons, J.
local.citation.publicationNameIEEE transactions on industrial electronics
local.citation.volumePP
local.citation.number99
local.citation.startingPage1
local.citation.endingPage7


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