Pattern formation in laminar flow of suspensions through square channels

dc.contributor.authorSeil, Philippe
dc.contributor.authorPirker, Stefan
dc.contributor.authorLichtenegger, Thomas
dc.date.accessioned2020-05-11T08:46:59Z
dc.date.available2020-05-11T08:46:59Z
dc.date.issued2017
dc.description.abstractThe study of particulate suspensions flowing through narrow channels has received much attention in the last decades, especially with advance in the field of microfluidics devices. In square channels, it is known that particles in dilute suspensions migrate to equilibrium positions at the channel faces, and also at the channel corners for a channel Reynolds number above 260. However, most studies focused on very dilute systems, excluding particle-particle interactions. In this paper, we present simulations of suspensions with solid fractions up to 3%. In these simulations, we find two new patterns: at Rech < 260, the equilibrium positions split up and particles assume a staggered position, and at Rech > 260, the fraction of particles moving to the corner equilibrium positions increases with solid fraction. We present a characterization of these two effects and speculate about possible mechanisms leading to the formation of both patterns.
dc.format.extent11 p.
dc.identifier.isbn978-84-946909-7-6
dc.identifier.urihttps://hdl.handle.net/2117/186974
dc.language.isoeng
dc.publisherCIMNE
dc.rights.accessOpen Access
dc.subject.lcshFinite element method
dc.subject.lcshComputational methods in mechanics
dc.subject.lcshParticle methods (Numerical analysis)
dc.subject.lemacElements finits, Mètode dels
dc.subject.otherLateral Migration, Channel Flow, Suspensions, Lattice Boltzmann Method, Discrete Element Method
dc.titlePattern formation in laminar flow of suspensions through square channels
dc.typeConference report
dspace.entity.typePublication
local.citation.contributorPARTICLES V
local.citation.endingPage67
local.citation.publicationNamePARTICLES V : proceedings of the V International Conference on Particle-Based Methods : fundamentals and applications
local.citation.startingPage57

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