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    • Analysis of the Atomic Layer Deposited Al2O3 field-effect passivation in black silicon 

      von Gastrow, Guillaume; Alcubilla González, Ramón; Ortega Villasclaras, Pablo Rafael; Yli-Koski, Marko; Conesa-Boj, Sònia; Fontcuberta i Morral, Anna; Savin, Hele (2015-11)
      Open Access
      We demonstrate that n-type black silicon can be passivated efficiently using Atomic Layer Deposited (ALD) Al2O3, reaching maximum surface recombination velocities below 7 cm/s. We show that the low surface recombination ...