Browsing by Subject "N100"
Now showing items 1-2 of 2
Electronic transport in low temperature nanocrystalline silicon thin-film transistors obtained by hot-wire CVD (2002-04)
Restricted access - publisher's policyHydrogenated nanocrystalline silicon (nc-Si:H) obtained by hot-wire chemical vapour deposition (HWCVD) at low substrate temperature (150 °C) has been incorporated as the active layer in bottom-gate thin-film transistors ...
Restricted access - publisher's policyHydrogenated microcrystalline silicon films obtained at low temperature (150–280°C) by hot wire chemical vapour deposition at two different process pressures were measured by Raman spectroscopy, X-ray diffraction (XRD) ...