Now showing items 1-13 of 13

    • A boolean rule-based approach for manufacturability-aware cell routing 

      Cortadella, Jordi; Petit Silvestre, Jordi; Gómez Fernández, Sergio; Moll Echeto, Francisco de Borja (2014-03-01)
      Article
      Open Access
      An approach for cell routing using gridded design rules is proposed. It is technology-independent and parameterizable for different fabrics and design rules, including support for multiple-patterning lithography. The core ...
    • Characterisation of the MUSIC ASIC for large-area silicon photomultipliers for gamma-ray astronomy 

      De Angelis, Nicolas; Gascón Fora, David; Gómez Fernández, Sergio; Heller, Matthieu; Montaruli, Teresa; Nagai, Andrii (2023-01-01)
      Article
      Open Access
      Large-area silicon photomultipliers (SiPMs) are desired in many applications where large surfaces have to be covered. For instance, a large area SiPM has been developed by Hamamatsu Photonics in collaboration with the ...
    • Design guidelines towards compact litho-friendly regular cells 

      Gómez Fernández, Sergio; Moll Echeto, Francisco de Borja; Rubio Sola, Jose Antonio; Elhoj, Martin; Schlinker, Guilherme; Woolaway, Nigel (2011)
      Conference report
      Open Access
    • FastIC: a fast integrated circuit for the readout of high performance detectors 

      Gómez Fernández, Sergio; Alozy, J.; Campbell, Michael; Manera Escalero, Rafael; Mauricio Ferré, Juan; Sanmukh, Anand; Sanuy Charles, Andreu; Ballabriga, Rafael; Gascón Fora, David (2022-05-01)
      Article
      Open Access
      This work presents the 8-channel FastIC ASIC developed in CMOS 65¿nm technology suitable for the readout of positive and negative polarity sensors in high energy physics experiments, Cherenkov detectors and time-of-flight ...
    • Lithography aware regular cell design based on a predictive technology model 

      Gómez Fernández, Sergio; Moll Echeto, Francisco de Borja (2010)
      Conference report
      Open Access
      As semiconductor technology advances into the nanoscale era, optical effects such as channel narrowing, corner rounding or line-end pullback are critical to accomplish circuit yield specifications. It is well-demonstrated ...
    • Lithography aware regular cell design based on a predictive technology model 

      Gómez Fernández, Sergio; Moll Echeto, Francisco de Borja (2010-12)
      Article
      Restricted access - publisher's policy
      As semiconductor technology advances into the nanoscale era, optical effects such as channel narrowing, corner rounding or line-end pullback are critical to accomplish circuit yield specifications. It is well-demonstrated ...
    • Lithography parametric yield estimation model to predict layout pattern distortions with a reduced set of lithography simulations 

      Gómez Fernández, Sergio; Moll Echeto, Francisco de Borja; Mauricio Ferré, Juan (2014-07-01)
      Article
      Open Access
      A lithography parametric yield estimation model is presented to evaluate the lithography distortion in a printed layout due to lithography hotspots. The aim of the proposed yield model is to provide a new metric that enables ...
    • Logic synthesis for manufacturability considering regularity and lithography printability 

      Machado, Lucas; Dal Bem, Vinicius; Moll Echeto, Francisco de Borja; Gómez Fernández, Sergio; Ribas, Renato P.; Reis, André Inácio (IEEE Computer Society Publications, 2013)
      Conference report
      Restricted access - publisher's policy
      This paper presents a novel yield model for integrated circuits manufacturing, considering lithography printability problems as a source of yield loss. The use of regular layouts can improve the printability of IC layouts, ...
    • Measurements of process variability in 40-nm regular and nonregular layouts 

      Mauricio Ferré, Juan; Moll Echeto, Francisco de Borja; Gómez Fernández, Sergio (2014-02-01)
      Article
      Restricted access - publisher's policy
      As technology scales down, IC design is becoming more difficult due to the increase in process variations, which translates into a dispersion of circuit parameter values thus degrading manufacturing yield. Regular layouts ...
    • New redundant logic design concept for high noise and low voltage scenarios 

      García Leyva, Lancelot; Andrade Miceli, Dennis Michael; Gómez Fernández, Sergio; Calomarde Palomino, Antonio; Moll Echeto, Francisco de Borja; Rubio Sola, Jose Antonio (2011-12)
      Article
      Restricted access - publisher's policy
      This paper presents a new redundant logia design concept named Turtle Logic(TL).It is a new probabilistic logic method based on port redundancy and complementary data, oriented toward emerging technologies beyond CMOS, ...
    • On the performance of STDMA Link Scheduling and Switched Beamforming Antennas in Wireless Mesh Networks 

      Gómez Fernández, Sergio (Universitat Politècnica de Catalunya, 2009-09-02)
      Master thesis (pre-Bologna period)
      Open Access
      Wireless Mesh Networks (WMNs) aim to revolutionize Internet connectivity due to its high throughput, cost-e ectiveness and ease deployment by providing last mile connectivity and/or backhaul support to di erent cellular ...
    • Regular cell design approach considering lithography-induced process variations 

      Gómez Fernández, Sergio (Universitat Politècnica de Catalunya, 2014-10-17)
      Doctoral thesis
      Open Access
      The deployment delays for EUVL, forces IC design to continue using 193nm wavelength lithography with innovative and costly techniques in order to faithfully print sub-wavelength features and combat lithography induced ...
    • Yield estimation model for lithography hotspot distortions 

      Gómez Fernández, Sergio; Moll Echeto, Francisco de Borja (Institution of Electrical Engineers, 2013-08-15)
      Article
      Restricted access - publisher's policy
      A yield formulation model to estimate the amount of lithography distortion expected in a printed layout is proposed. The yield formulation relates the probability of non-failure of a lithography hotspot with the yield ...