Growth and physical properties of highly oriented La-doped (K,Na)NbO3 ferroelectric thin films
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Lead-free (K,Na)NbO3 (KNN) and La doped (K,Na)NbO3 (KNN-La) thin films are grown on SrTiO3 substrates using the chemical solution deposition method. The effect of adding different amounts of Na and K excess (0-20 mol%) is investigated. The results confirm the necessity of adding 20 mol% excess amounts of Na and K precursor solutions in order to avoid the formation of the secondary phase, K4Nb6O17, as confirmed by X-ray diffraction and Raman spectroscopy. Moreover, when adding a 20 mol% of alkaline metal excess, the thin films are highly textured with out-of-plane preferential orientation in the  direction of the  orientation of the substrate. Doping with lanthanum results in a decrease of the leakage current density at low electric field, and an increase in the dielectric permittivity across the whole temperature range (80-380 K). Although the (100)-oriented KNN and KNN-La films exhibited rounded hysteresis loops, at low temperatures the films show the typical ferroelectric hysteresis loops. (C) 2015 Elsevier B.V. All rights reserved.
CitacióVendrell, X. [et al.]. Growth and physical properties of highly oriented La-doped (K,Na)NbO3 ferroelectric thin films. "Thin solid films", 27 Febrer 2015, vol. 577, p. 35-41.
Versió de l'editorhttp://www.sciencedirect.com/science/article/pii/S0040609015000723