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dc.contributor.authorMachado, Lucas
dc.contributor.authorDal Bem, Vinicius
dc.contributor.authorMoll Echeto, Francisco de Borja
dc.contributor.authorGómez Fernández, Sergio
dc.contributor.authorRibas, Renato P.
dc.contributor.authorReis, André Inácio
dc.contributor.otherUniversitat Politècnica de Catalunya. Departament d'Enginyeria Electrònica
dc.date.accessioned2014-04-04T17:38:26Z
dc.date.created2013
dc.date.issued2013
dc.identifier.citationMachado, L. [et al.]. Logic synthesis for manufacturability considering regularity and lithography printability. A: IEEE Computer Society Symposium on VLSI. "ISVLSI 2013: 2013 IEEE Computer Society Annual Symposium on VLSI: Natal, Brazil: August 5-7, 2013". Natal: IEEE Computer Society Publications, 2013, p. 230-235.
dc.identifier.isbn978-1-4799-1331-2
dc.identifier.urihttp://hdl.handle.net/2117/22528
dc.description.abstractThis paper presents a novel yield model for integrated circuits manufacturing, considering lithography printability problems as a source of yield loss. The use of regular layouts can improve the printability of IC layouts, but it results in a significant area overhead by introducing regularity. To the best of our knowledge, this is the first approach that considers the tradeoff of cells with different levels of regularity and different area overheads during the logic synthesis, in order to improve overall design yield. A technology remapping tool with such yield model as cost function is proposed and implemented and interesting results are presented.
dc.format.extent6 p.
dc.language.isoeng
dc.publisherIEEE Computer Society Publications
dc.rightsAttribution-NonCommercial-NoDerivs 3.0 Spain
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/3.0/es/
dc.subjectÀrees temàtiques de la UPC::Enginyeria electrònica::Microelectrònica::Circuits integrats
dc.subject.lcshIntegrated circuits
dc.subject.lcshLithography
dc.subject.otherDesign for manufacture
dc.subject.otherIntegrated circuit layout
dc.subject.otherLithography
dc.subject.otherIC layout
dc.subject.otherIntegrated circuit manufacturing
dc.subject.otherLithography printability
dc.subject.otherLogic synthesis
dc.subject.othertechnology remapping tool
dc.subject.otherYield loss
dc.subject.otherCost function
dc.subject.otherIntegrated circuit modeling
dc.subject.otherLayout
dc.subject.otherLibraries
dc.subject.otherLithography
dc.subject.otherSemiconductor device modeling
dc.subject.otherSuperluminescent diodes
dc.subject.otherLithography
dc.subject.otherRegularity
dc.subject.otherTechnology mapping
dc.subject.otherYield model
dc.titleLogic synthesis for manufacturability considering regularity and lithography printability
dc.typeConference report
dc.subject.lemacCircuits integrats
dc.subject.lemacLitografia
dc.contributor.groupUniversitat Politècnica de Catalunya. HIPICS - Grup de Circuits i Sistemes Integrats d'Altes Prestacions
dc.identifier.doi10.1109/ISVLSI.2013.6654638
dc.description.peerreviewedPeer Reviewed
dc.relation.publisherversionhttp://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=6654638&isnumber=6654605
dc.rights.accessRestricted access - publisher's policy
local.identifier.drac12913050
dc.description.versionPostprint (published version)
dc.date.lift10000-01-01
local.citation.authorMachado, L.; Dal Bem, V.; Moll, F.; Gómez, S.; Ribas, R. P.; Reis, A. I.
local.citation.contributorIEEE Computer Society Symposium on VLSI
local.citation.pubplaceNatal
local.citation.publicationNameISVLSI 2013: 2013 IEEE Computer Society Annual Symposium on VLSI: Natal, Brazil: August 5-7, 2013
local.citation.startingPage230
local.citation.endingPage235


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