Lithography aware regular cell design based on a predictive technology model
Tipus de documentText en actes de congrés
Condicions d'accésAccés obert
Projecte de la Comissió EuropeaSYNAPTIC - SYNthesis using Advanced Process Technology Integrated in regular Cells, IPs, architectures, and design platforms (EC-FP7-248538)
As semiconductor technology advances into the nanoscale era, optical effects such as channel narrowing, corner rounding or line-end pullback are critical to accomplish circuit yield specifications. It is well-demonstrated that layout regularity reduces the increasing impact of process variations on circuit performance and reliability. The purpose of this paper is to present the layout design of a regular cell based on 1-D elements which reduces lithography perturbations (ALARC). We depict several undesirable lithography effects and how these effects determine several layout parameters in order to achieve the required line-pattern resolution.
CitacióGómez, S.; Moll, F. Lithography aware regular cell design based on a predictive technology model. A: European workshop on CMOS Variability. "The 1st European workshop on CMOS Variability". Montpellier: 2010.