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dc.contributorLaguarta Bertran, Ferran
dc.contributor.authorAguerri Cavero, Alberto
dc.date.accessioned2010-12-03T08:52:44Z
dc.date.available2010-12-03T08:52:44Z
dc.date.issued2010
dc.identifier.urihttp://hdl.handle.net/2099.1/10416
dc.descriptionTesina feta en col.laboració amb Sensofar-Tech, S.L.
dc.description.abstractThe characterization of stratified media has become essential in the development of industrial applications such as LEDs, solar cells, medical devices, MEMs, MOEMS, etc. This characterization involves measuring the thickness and optical constants of thin layers with high lateral and vertical resolutions. For this purpose, we integrated a spectroscopic reflectometer into an existing 3D optical profiler. We also analyzed how the numerical aperture affects the thickness measurements.
dc.language.isoeng
dc.publisherUniversitat Politècnica de Catalunya
dc.rightsAttribution-NonCommercial-NoDerivs 3.0 Spain
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/3.0/es/
dc.subjectÀrees temàtiques de la UPC::Enginyeria dels materials
dc.subject.other3D optical profiler
dc.subject.otherNumerical aperture
dc.subject.otherThin film
dc.subject.otherStratified media
dc.titleCharacterization of stratified media using high-resolution thin film measurement techniques
dc.typeMaster thesis
dc.subject.lemacSemiconductors de pel·lícula fina
dc.rights.accessOpen Access
dc.audience.educationlevelMàster
dc.audience.mediatorEscola Tècnica Superior d'Enginyeria Industrial de Barcelona


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