• Improvement of crystalline silicon surface passivation by hidrogen plasma treatment 

      Martín García, Isidro; Vetter, Michael; Orpella García, Alberto; Voz Sánchez, Cristóbal; Puigdollers i González, Joaquim; Alcubilla González, Ramón; Kharchenko, A.V.; Roca i Cabarrocas, Pere (American Institute of Physics, 2004-03-01)
      Article
      Accés restringit per política de l'editorial
      A completely dry low-temperature process has been developed to passivate 3.3 Ωcm p-type crystalline silicon surface with excellent results. Particularly, we have investigated the use of a hydrogen plasma treatment, just ...
    • “Silicon millefeuille” : From a silicon wafer to multiple thin crystalline films in a single step 

      Hernández García, David; Todorov Trifonov, Trifon; Garin Escriva, Moises; Alcubilla González, Ramón (2013-04-29)
      Article
      Accés obert
      During the last years, many techniques have been developed to obtain thin crystalline films from commercial silicon ingots. Large market applications are foreseen in the photovoltaic field, where important cost reductions ...