Exploració per tema "Litografia per feix d'electrons"
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Yield estimation model for lithography hotspot distortions
(Institution of Electrical Engineers, 2013-08-15)
Article
Accés restringit per política de l'editorialA yield formulation model to estimate the amount of lithography distortion expected in a printed layout is proposed. The yield formulation relates the probability of non-failure of a lithography hotspot with the yield ...