• Electron beam lithography for direct patterning of MoS2on PDMS substrates 

      Jumbert, Gil; Placidi, Marcel Jose; Alzina, F.; Sotomayor Torres, Clivia M.; Sledzinska, Marianna (Royal Society of Chemistry (RSC), 2021-06-09)
      Article
      Accés obert
      Precise patterning of 2D materials into micro- and nanostructures presents a considerable challenge and many efforts are dedicated to the development of processes alternative to the standard lithography. In this work we ...
    • Introducing surface functionality on thermoformed polymeric films 

      Sáez Comet, Carlos; Muntada López, Olga; Francone, Achille; Lozano Hernández, Nekane; Fernandez Regulez, Marta; Puiggalí Bellalta, Jordi; Kehagias, Nikolaos; Sotomayor Torres, Clivia M.; Pérez Murano, Francesc (Elsevier, 2022-04-01)
      Article
      Accés obert
      We present a fabrication process for the production of 3-dimensional micro-structured polymeric films. The microstructures are fabricated in a single step using thermal nanoimprint lithography as patterning technique. The ...
    • Lithography parametric yield estimation model to predict layout pattern distortions with a reduced set of lithography simulations 

      Gómez Fernández, Sergio; Moll Echeto, Francisco de Borja; Mauricio Ferré, Juan (2014-07-01)
      Article
      Accés obert
      A lithography parametric yield estimation model is presented to evaluate the lithography distortion in a printed layout due to lithography hotspots. The aim of the proposed yield model is to provide a new metric that enables ...
    • Logic synthesis for manufacturability considering regularity and lithography printability 

      Machado, Lucas; Dal Bem, Vinicius; Moll Echeto, Francisco de Borja; Gómez Fernández, Sergio; Ribas, Renato P.; Reis, André Inácio (IEEE Computer Society Publications, 2013)
      Text en actes de congrés
      Accés restringit per política de l'editorial
      This paper presents a novel yield model for integrated circuits manufacturing, considering lithography printability problems as a source of yield loss. The use of regular layouts can improve the printability of IC layouts, ...
    • Origin of dynamic Nematic order in epethelial cell layers 

      Prol Castelo, Guillermo (Universitat Politècnica de Catalunya, 2019-07-09)
      Treball Final de Grau
      Accés obert
      Realitzat a/amb:   Technische Universität München
      Collective cell migration involves not only the need for cells to assemble into and sustain a certain architecture ? they must also coordinate their behaviors across space and time. Cells in a layer will arrange in different ...
    • Spatial filtering with photonic crystals 

      Maigyte, Lina; Staliunas, Kestutis (2015-03-01)
      Article
      Accés restringit per política de l'editorial
      Photonic crystals are well known for their celebrated photonic band-gaps-the forbidden frequency ranges, for which the light waves cannot propagate through the structure. The frequency (or chromatic) band-gaps of photonic ...
    • VCTA: A Via-Configurable Transistor Array regular fabric 

      Pons Solé, Marc; Moll Echeto, Francisco de Borja; Rubio Sola, Jose Antonio; Abella Ferrer, Jaume; Vera Rivera, Francisco Javier; González Colás, Antonio María (IEEE Computer Society Publications, 2010)
      Text en actes de congrés
      Accés obert
      Layout regularity is introduced progressively by integrated circuit manufacturers to reduce the increasing systematic process variations in the deep sub-micron era. In this paper we focus on a scenario where layout regularity ...
    • Yield estimation model for lithography hotspot distortions 

      Gómez Fernández, Sergio; Moll Echeto, Francisco de Borja (Institution of Electrical Engineers, 2013-08-15)
      Article
      Accés restringit per política de l'editorial
      A yield formulation model to estimate the amount of lithography distortion expected in a printed layout is proposed. The yield formulation relates the probability of non-failure of a lithography hotspot with the yield ...