Exploració per tema "Design for manufacturability"
Ara es mostren els items 1-5 de 5
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A boolean rule-based approach for manufacturability-aware cell routing
(2014-03-01)
Article
Accés obertAn approach for cell routing using gridded design rules is proposed. It is technology-independent and parameterizable for different fabrics and design rules, including support for multiple-patterning lithography. The core ... -
Area-optimal transistor folding for 1-D gridded cell design
(2013-11)
Article
Accés obertThe 1-D design style with gridded design rules is gaining ground for addressing the printability issues in subwavelength photolithography. One of the synthesis problems in cell generation is transistor folding, which ... -
FOCSI: A new layout regularity metric
(2009-06-09)
Report de recerca
Accés obertDigital CMOS Integrated Circuits (ICs) suffer from serious layout features printability issues associated to the lithography manufacturing process. Regular layout designs are emerging as alternative solutions to reduce ... -
Lithography parametric yield estimation model to predict layout pattern distortions with a reduced set of lithography simulations
(2014-07-01)
Article
Accés obertA lithography parametric yield estimation model is presented to evaluate the lithography distortion in a printed layout due to lithography hotspots. The aim of the proposed yield model is to provide a new metric that enables ... -
On the use of static temperature measurements as process variation observable
(2012-10)
Article
Accés restringit per política de l'editorialIn this paper we present the use of static temperature measurements as process variation observable. Contrary to previously published thermal testing methods, the proposed methodology does not need an excitation signal, ...