Exploració per autor "Gómez Fernández, Sergio"Més informacióMés informació

Ara es mostren els items 12-13 de 13

    • Regular cell design approach considering lithography-induced process variations 

      Gómez Fernández, Sergio (Universitat Politècnica de Catalunya, 2014-10-17)
      Tesi
      Accés obert
      The deployment delays for EUVL, forces IC design to continue using 193nm wavelength lithography with innovative and costly techniques in order to faithfully print sub-wavelength features and combat lithography induced ...

    • Yield estimation model for lithography hotspot distortions 

      Gómez Fernández, Sergio; Moll Echeto, Francisco de Borja (Institution of Electrical Engineers, 2013-08-15)
      Article
      Accés restringit per política de l'editorial
      A yield formulation model to estimate the amount of lithography distortion expected in a printed layout is proposed. The yield formulation relates the probability of non-failure of a lithography hotspot with the yield ...